Company News, Patents

Shiseido Earns Patent

Author Image

By: TOM BRANNA

Editor

● Patent No. US 6,607,736 B2: Shiseido Co., Ltd., Tokyo, Japan, patented an endermic liniment skin care preparation comprising a polyoxyethylene dicarboxylate derived from diethoxy ethyl succinate and a humectant....

Continue reading this story and get 24/7 access to Happi for FREE


Already a subscriber? Sign in

Keep Up With Our Content. Subscribe To Happi Newsletters